Low Temperature Plasma Technology Laboratory Physical Mechanisms in Industrial RF Plasma Sources
نویسنده
چکیده
RF plasma sources are essential for producing semiconductor chips, but they are developed empirically, with incomplete knowledge of how they work. Inductively coupled plasmas (ICPs) employ rf fields without a dc magnetic field B0 and produce ionization well outside the skin layer. Helicon sources with a B0 can generate much higher densities but pose a number of puzzling physical questions. Of these, a selected few are discussed in this paper. ENERGY DEPOSITION IN INDUCTIVELY COUPLED PLASMAS Figure 1 shows two common types of ICP, (a) with a spiral stove-top antenna, and (b) with an antenna wound on the cylindrical surface; others combine them with a dome-shaped coil . All can produce uniform plasmas, but type (b) does so even if the
منابع مشابه
Low Temperature Plasma Technology Laboratory RF Plasma Sources for Semiconductor Processing
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